Dr. Elton Graugnard is an associate professor in the Micron School of Materials Science and Engineering. He joined Boise State University in 2009. He is currently working on atomic layer deposition (ALD) of thin and atomic-layered films. As the Primary Investigator of the Atomic Films Lab at Boise State University, he leads a team of students and staff to work to develop thin film deposition and characterization processes and to apply thin film coatings to a range of applications. A key area of his research is the development of atomic layer deposition (ALD) and atomic layer etching (ALE) processes for atomically-thin two-dimensional (2D) materials, which may be only a few atoms in thickness. His interests lie in developing new ALD processes for materials with potentially useful properties. Dr. Graugnard has expertise in atomic layer deposition (ALD), ultra-high vacuum scanning tunneling microscopy (STM), DNA nanotechnology, and nanoscale materials synthesis and characterization.

Educational Background
Dr. Graugnard has a B.S. in Physics from Centenary College of Louisiana. He holds a PhD (2000) and MS (1998), both in Physics from Purdue University.