Abstract
We report the fabrication of photonic crystal phosphors by atomic layer deposition and the subsequent removal of self-assembled opal templates. ZnS:Mn and TiO 2 inverse opals as well as ZnS:Mn/TiO 2 composite inverse opals were formed. Shifts in the Γ-L photonic band gap positions were confirmed by reflectivity and transmission measurements and were consistent with photonic band structure calculations. The peak positions confirm that filling terminates at ∼86% of the pore volume in agreement the maximum possible filling fraction for the "shell" infiltration of an opal structure. For TiO 2 depositions, SEM and AFM analysis reveals ultra-smooth highly conformal films. In addition, infiltration control to < 1 nm was achieved, making fine-tuning of PC properties possible. Significant changes were observed in the emission characteristics for composite ZnS:Mn/TiO 2 photonic crystals. This work demonstrates that precisely controlling the placement of materials is possible by ALD, enabling the fabrication of "optimized" structures, including those which modify emission properties.
| Original language | English |
|---|---|
| Article number | 21 |
| Pages (from-to) | 142-149 |
| Number of pages | 8 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 5801 |
| DOIs | |
| State | Published - 2005 |
| Event | Cockpit and Future Displays for Defense and Security - Orlando, FL, United States Duration: 30 Mar 2005 → 1 Apr 2005 |
Keywords
- Atomic layer deposition
- Inverse opal
- Photonic crystal