Accuracy improvements in LPC measurements for CMP slurries

Bruno Tolla; David Boidridge

Accuracy improvements in LPC measurements for CMP slurries

Bruno Tolla, David Boidridge

Chemistry Department

Cabot Microelectronics Corporation

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

We have examined the Large Particle Count (LPC) analytical method to see whether there are opportunities to improve both the accuracy and precision in hope of improving the utility of the LPC measurement. We have identified weaknesses in the current method that limit both its accuracy and its precision, and which can introduce count errors in excess of a factor of 10. We propose modifications to the current method which result in both accuracy and precision improvements. We recommend these improvements as absolutely necessary for any experiments designed to test the correlation between LPC and defectivity.

Original language	English
Title of host publication	Science and Technology of Chemical Mechanical Planarization (CMP)
Pages	59-64
Number of pages	6
State	Published - 2010
Event	2009 MRS Spring Meeting - San Francisco, CA, United States Duration: 14 Apr 2009 → 17 Apr 2009

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	1157
ISSN (Print)	0272-9172

Conference

Conference	2009 MRS Spring Meeting
Country/Territory	United States
City	San Francisco, CA
Period	14/04/09 → 17/04/09

Cite this

@inproceedings{35e72c3ac51f4dcf848fe5e3f7317b04,

title = "Accuracy improvements in LPC measurements for CMP slurries",

abstract = "We have examined the Large Particle Count (LPC) analytical method to see whether there are opportunities to improve both the accuracy and precision in hope of improving the utility of the LPC measurement. We have identified weaknesses in the current method that limit both its accuracy and its precision, and which can introduce count errors in excess of a factor of 10. We propose modifications to the current method which result in both accuracy and precision improvements. We recommend these improvements as absolutely necessary for any experiments designed to test the correlation between LPC and defectivity.",

author = "Bruno Tolla and David Boidridge",

year = "2010",

language = "English",

isbn = "9781605111308",

series = "Materials Research Society Symposium Proceedings",

pages = "59--64",

booktitle = "Science and Technology of Chemical Mechanical Planarization (CMP)",

note = "2009 MRS Spring Meeting ; Conference date: 14-04-2009 Through 17-04-2009",

}

TY - GEN

T1 - Accuracy improvements in LPC measurements for CMP slurries

AU - Tolla, Bruno

AU - Boidridge, David

PY - 2010

Y1 - 2010

N2 - We have examined the Large Particle Count (LPC) analytical method to see whether there are opportunities to improve both the accuracy and precision in hope of improving the utility of the LPC measurement. We have identified weaknesses in the current method that limit both its accuracy and its precision, and which can introduce count errors in excess of a factor of 10. We propose modifications to the current method which result in both accuracy and precision improvements. We recommend these improvements as absolutely necessary for any experiments designed to test the correlation between LPC and defectivity.

AB - We have examined the Large Particle Count (LPC) analytical method to see whether there are opportunities to improve both the accuracy and precision in hope of improving the utility of the LPC measurement. We have identified weaknesses in the current method that limit both its accuracy and its precision, and which can introduce count errors in excess of a factor of 10. We propose modifications to the current method which result in both accuracy and precision improvements. We recommend these improvements as absolutely necessary for any experiments designed to test the correlation between LPC and defectivity.

UR - http://www.scopus.com/inward/record.url?scp=77954001144&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:77954001144

SN - 9781605111308

T3 - Materials Research Society Symposium Proceedings

SP - 59

EP - 64

BT - Science and Technology of Chemical Mechanical Planarization (CMP)

T2 - 2009 MRS Spring Meeting

Y2 - 14 April 2009 through 17 April 2009

ER -

Accuracy improvements in LPC measurements for CMP slurries

Abstract

Publication series

Conference

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