Adsorption-Controlled Growth of BiVO4 by Molecular-Beam Epitaxy

D. A. Hillsberry, D. A. Tenne, S. Stoughton, M. Showak, Q. Mao, P. Koirala, S. Sallis, L. F. Kourkoutis, K. Nguyen, L. F.J. Piper, N. J. Podraza, D. A. Muller, C. Adamo, D. G. Schlom

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73 Scopus citations

Abstract

<p> Single-phase epitaxial films of the monoclinic polymorph of BiVO <sub> 4 </sub> were synthesized by reactive molecular-beam epitaxy under adsorption-controlled conditions. The BiVO <sub> 4 </sub> films were grown on (001) yttria-stabilized cubic zirconia (YSZ) substrates. Four-circle x-ray diffraction, scanning transmission electron microscopy (STEM), and Raman spectroscopy confirm the epitaxial growth of monoclinic BiVO <sub> 4 </sub> with an atomically abrupt interface and orientation relationship (001) <sub> BiVO <sub> 4 </sub> </sub> &spar; (001) <sub> YSZ </sub> with [100] <sub> BiVO <sub> 4 </sub> </sub> &spar; [100] <sub> YSZ </sub> . Spectroscopic ellipsometry, STEM electron energy loss spectroscopy (STEM-EELS), and x-ray absorption spectroscopy indicate that the films have a direct band gap of 2.5 &plusmn; 0.1 eV.</p>
Original languageAmerican English
Article number042112
JournalAPL Materials
Volume1
Issue number4
DOIs
StatePublished - 1 Oct 2013

Keywords

  • band gap
  • epitaxy
  • polymorphism
  • thin films
  • x-ray diffraction

EGS Disciplines

  • Physics

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