ALD (Atomic layer deposition) Process Monitoring with FTIR Spectroscopy

Hector Mendez-Garcia, Elton Graugnard, Steven Hues, Anthony Donegan

Research output: Contribution to conferencePresentation

Abstract

In this project, our primary objective is to design, fabricate, and test an interface between a Fourier transform infrared spectrometer (FTIR) and an atomic layer deposition (ALD) reactor in order to provide for real-time monitoring of the ALD process with infrared spectroscopy.

Original languageAmerican English
StatePublished - 12 Jul 2022

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