ALD (Atomic layer deposition) Process Monitoring with FTIR Spectroscopy

Hector Mendez-Garcia; Elton Graugnard; Steven Hues; Anthony Donegan

ALD (Atomic layer deposition) Process Monitoring with FTIR Spectroscopy

Hector Mendez-Garcia
, Elton Graugnard
, Steven Hues
, Anthony Donegan

Micron School of Materials Science and Engineering

Boise State University

Research output: Contribution to conference › Presentation

Abstract

In this project, our primary objective is to design, fabricate, and test an interface between a Fourier transform infrared spectrometer (FTIR) and an atomic layer deposition (ALD) reactor in order to provide for real-time monitoring of the ALD process with infrared spectroscopy.

Original language	American English
State	Published - 1 Jul 2022

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title = "ALD (Atomic layer deposition) Process Monitoring with FTIR Spectroscopy",

abstract = " In this project, our primary objective is to design, fabricate, and test an interface between a Fourier transform infrared spectrometer (FTIR) and an atomic layer deposition (ALD) reactor in order to provide for real-time monitoring of the ALD process with infrared spectroscopy.",

author = "Hector Mendez-Garcia and Elton Graugnard and Steven Hues and Anthony Donegan",

year = "2022",

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TY - CONF

T1 - ALD (Atomic layer deposition) Process Monitoring with FTIR Spectroscopy

AU - Mendez-Garcia, Hector

AU - Graugnard, Elton

AU - Hues, Steven

AU - Donegan, Anthony

PY - 2022/7/1

Y1 - 2022/7/1

N2 - In this project, our primary objective is to design, fabricate, and test an interface between a Fourier transform infrared spectrometer (FTIR) and an atomic layer deposition (ALD) reactor in order to provide for real-time monitoring of the ALD process with infrared spectroscopy.

AB - In this project, our primary objective is to design, fabricate, and test an interface between a Fourier transform infrared spectrometer (FTIR) and an atomic layer deposition (ALD) reactor in order to provide for real-time monitoring of the ALD process with infrared spectroscopy.

M3 - Presentation

ER -

ALD (Atomic layer deposition) Process Monitoring with FTIR Spectroscopy

Abstract

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