@inproceedings{73bb9effd25e40bb92581df989df8caa,
title = "Aromatizing unzipping polyester for EUV photoresist",
abstract = "New {"}self-immolating{"} or {"}unzipping{"} polymers, materials that depolymerize in response to irradiation, were designed and prepared successfully. We studied several candidate polymers and ultimately chose two of them for further development. One is a polyester that aromatizes upon depolymerization. The unzipping reaction initiated by UV exposure in solution was confirmed. The polymer was then studied in thin films to assess its potential for use in formulating photoresists. The neat polymer was tested as a blend with novolac resin. The effect of unzipping polyester loading in novolac on the rate of dissolution of films in TMAH was studied. Inhibition occurs at 20-30\% loading. The films were exposed with DUV light and patterning was observed. The sensitivity of the unzipping polyester formulation is low in part due to the low absorption of the polymer for UV light. However, the polymer showed higher sensitivity with EUV exposure and first contrast curves show sensitivity in the range of 20-25mJ/cm2.",
keywords = "chain scission, EUV lithography, non-CAR",
author = "Kensuke Matsuzawa and Ryan Mesch and Michael Olah and Wade Wang and Phillips, \{Scott T.\} and Willson, \{C. Grant\}",
note = "Publisher Copyright: {\textcopyright} 2015 SPIE.; Advances in Patterning Materials and Processes XXXII ; Conference date: 23-02-2015 Through 26-02-2015",
year = "2015",
doi = "10.1117/12.2085780",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
editor = "Wallow, \{Thomas I.\} and Hohle, \{Christoph K.\}",
booktitle = "Advances in Patterning Materials and Processes XXXII",
}