Atomic layer deposition for nano-fabrication of optoelectronic devices

We present recent investigations of the atomic layer deposition (ALD) of high transparency, high index, luminescent, and optoelectronic materials into self-assembled opal, lithographic, and biologically derived templates. Investigations on inverse opal based structures, which have the potential to sustain a complete photonic band gap, are presented and have been infiltrated with depositions of TiO₂, Al₂O₃, ZnS:Mn and GaP. It is demonstrated that derivatives of the opal structure can be obtained by the use of a sacrificial buffer layer technique. Consequently, structures can be inverted, precisely replicated, and formed from composite or multilayered materials that allow a high degree of functionality. Additionally, this process enables temperature-sensitive polymer structures to be inverted by low temperature ALD to a high temperature compatible material that then serves as a high temperature template. Recent work is presented on the application of this technique to tune the properties of 2D photonic crystal slab waveguides and for the coating of biological scaffolds. copyright The Electrochemical Society.