Atomic Layer Processing of MoS2

Wesley Jen, John D. Hues, Jake Soares, Steven Letourneau, Matthew Lawson, Devika Choudhury, Anil U. Mane, Yu Lu, Yaqiao Wu, Steven M. Hues, Lan Li, Jeffrey W. Elam, Elton Graugnard

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

Molybdenum disulfide (MoS2) is one of several transition metal dichalcogenides consisting of a layer of transition atoms sandwiched between layers of chalcogens.[l] Interest in MoS2 has been driven by the fact that it exhibits a 1.8 e V direct electronic band gap in monolayer form and retains a moderate electron mobility (>10 cm2/Vs) even when only ∼6.5 Å (three atoms) thick. [2] These properties offer potential for retaining or improving speed and efficiency in scaled electronic devices.

Original languageEnglish
Title of host publication2023 IEEE Workshop on Microelectronics and Electron Devices, WMED 2023
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9798350336450
DOIs
StatePublished - 2023
Event20th Annual IEEE Workshop on Microelectronics and Electron Devices, WMED 2023 - Boise, United States
Duration: 31 Mar 2023 → …

Publication series

NameIEEE Workshop on Microelectronics and Electron Devices, WMED
Volume2023-March
ISSN (Print)1947-3834
ISSN (Electronic)1947-3842

Conference

Conference20th Annual IEEE Workshop on Microelectronics and Electron Devices, WMED 2023
Country/TerritoryUnited States
CityBoise
Period31/03/23 → …

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