Comparison of the electrical response of Cu and Ag ion-conducting SDC memristors over the temperature range 6 K to 300 K

Kolton Drake, Tonglin Lu, Md Kamrul H. Majumdar, Kristy A. Campbell

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

Electrical performance of self-directed channel (SDC) ion-conducting memristors which use Ag and Cu as the mobile ion source are compared over the temperature range of 6 K to 300 K. The Cu-based SDC memristors operate at temperatures as low as 6 K, whereas Ag-based SDC memristors are damaged if operated below 125 K. It is also observed that Cu reversibly diffuses into the active Ge2Se3 layer during normal device shelf-life, thus changing the state of a Cu-based memristor over time. This was not observed for the Ag-based SDC devices. The response of each device type to sinusoidal excitation is provided and shows that the Cu-based devices exhibit hysteresis lobe collapse at lower frequencies than the Ag-based devices. In addition, the pulsed response of the device types is presented.

Original languageEnglish
Article number663
JournalMicromachines
Volume10
Issue number10
DOIs
StatePublished - 1 Oct 2019

Keywords

  • Chalcogenide
  • Electrochemical metallization (ECM)
  • Electrochemical metallization cell
  • Ion conduction
  • Memristor
  • Self-directed channel (SDC)

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