TY - GEN
T1 - Device fabrication in high-index 3D photonic crystals
AU - Roche, Olivia M.
AU - Scrimgeour, Jan
AU - King, Jeffrey S.
AU - Sharp, David N.
AU - Blanford, Christopher F.
AU - Graugnard, Elton
AU - Denning, Robert G.
AU - Summers, Christopher J.
AU - Turberfield, Andrew J.
PY - 2006
Y1 - 2006
N2 - Holographic lithography (HL) is a flexible technique for the fabrication of three-dimensional (3D) photonic crystals with the submicron periodicity required for optical and near-IR applications. We demonstrate two key steps towards the creation of integrated optical devices based on waveguides and microcavities operating within a complete photonic band gap: 1) infiltration of a holographically-defined polymeric 3D photonic crystal template with high-index dielectric by Atomic Layer Deposition (ALD) [1]; and 2) creation of localised structural defects embedded in, and in registration with, a 3D photonic crystal by direct two-photon laser writing [2], Structural and optical characterisation of TiO2 photonic crystals produced by infiltration and removal of the polymer template demonstrates the high quality of the negative replica. Structural characterisation of photonic crystals with embedded defects shows a faithful rendering of the designed structure in the developed polymer photonic crystal. The combination of these three techniques (HL, two-photon writing and ALD) maps out a clear route to device fabrication in high-index 3D photonic crystals.
AB - Holographic lithography (HL) is a flexible technique for the fabrication of three-dimensional (3D) photonic crystals with the submicron periodicity required for optical and near-IR applications. We demonstrate two key steps towards the creation of integrated optical devices based on waveguides and microcavities operating within a complete photonic band gap: 1) infiltration of a holographically-defined polymeric 3D photonic crystal template with high-index dielectric by Atomic Layer Deposition (ALD) [1]; and 2) creation of localised structural defects embedded in, and in registration with, a 3D photonic crystal by direct two-photon laser writing [2], Structural and optical characterisation of TiO2 photonic crystals produced by infiltration and removal of the polymer template demonstrates the high quality of the negative replica. Structural characterisation of photonic crystals with embedded defects shows a faithful rendering of the designed structure in the developed polymer photonic crystal. The combination of these three techniques (HL, two-photon writing and ALD) maps out a clear route to device fabrication in high-index 3D photonic crystals.
UR - http://www.scopus.com/inward/record.url?scp=34250672867&partnerID=8YFLogxK
U2 - 10.1109/ICTON.2006.248462
DO - 10.1109/ICTON.2006.248462
M3 - Conference contribution
AN - SCOPUS:34250672867
SN - 1424402360
SN - 9781424402366
T3 - 2006 International Conference on Transparent Optical Networks
SP - 259
BT - 2006 International Conference on Transparent Optical Networks, ICTON 2006
T2 - 2006 International Conference on Transparent Optical Networks, ICTON 2006
Y2 - 18 June 2006 through 22 June 2006
ER -