First-Principles Study for ALD of MoS2

Keyphrases

• Atomic Layer Deposition 100%
• Molybdenite 100%
• First-principles Study 100%
• Aluminum Oxide 66%
• Hydroxyl Group 66%
• F Atoms 66%
• Al Atom 66%
• Rutile 33%
• Density Functional Theory 33%
• Surface Properties 33%
• Surface Hydroxyl Groups 33%
• Microelectronics 33%
• H 2 S 33%
• Oxidation State 33%
• Modeled Systems 33%
• Deposition Process 33%
• N 2O 33%
• Electron Distribution 33%
• Cyclical Processes 33%
• Thin Film Growth 33%
• Thickness Control 33%
• Geometry Distribution 33%
• Ground State Geometry 33%
• Vienna Ab Initio Simulation Package 33%
• Atomic Thickness 33%

Material Science

• Density 100%
• Ab Initio Simulation 100%
• Titanium Oxide 100%
• Surface Property 100%
• Thin Film Growth 100%