Abstract
Practical methods of microfabrication are vital for the development of photonic-crystal-based signal processing. However, extension of the optical methods that dominate integrated circuit fabrication to three dimensions is challenging. This communication reports an essential step for creation of devices operating within a full photonic band gap: atomic layer deposition is used to create the high-index TiO2 replicas of holographically defined photonic crystals shown in the figure.
Original language | American English |
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Journal | Advanced Materials |
Volume | 18 |
Issue number | 12 |
State | Published - 1 Jun 2006 |
Externally published | Yes |
Keywords
- Atomic layer deposition
- Chemical vapor deposition
- Holography
- Photonic crystals
- Two-photon absorption
EGS Disciplines
- Mechanical Engineering