Investigation of tunneling current in SiO2/HfO2 gate stacks for flash memory applications
- Bhaswar Chakrabarti
- , Heesoo Kang
- , Barry Brennan
- , Tae Joo Park
- , Kurtis D. Cantley
- , Adam Pirkle
- , Stephen McDonnell
- , Jiyoung Kim
- , Robert M. Wallace
- , Eric M. Vogel
- University of Texas at Dallas
- Samsung
- Hanyang University
- Intel
- Georgia Institute of Technology
Research output: Contribution to journal › Article › peer-review
5
Scopus
citations