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Investigation of tunneling current in SiO2/HfO2 gate stacks for flash memory applications
Bhaswar Chakrabarti, Heesoo Kang, Barry Brennan, Tae Joo Park, Kurtis D. Cantley, Adam Pirkle, Stephen McDonnell, Jiyoung Kim, Robert M. Wallace, Eric M. Vogel
Research output: Contribution to journal › Article › peer-review