Martensitic transformation in Ni-Mn-Ga/Si(100) thin films

I. R. Aseguinolaza; I. Orue; A. V. Svalov; K. Wilson; P. Müllner; J. M. Barandiarán; V. A. Chernenko

doi:10.1016/j.tsf.2014.02.056

Martensitic transformation in Ni-Mn-Ga/Si(100) thin films

I. R. Aseguinolaza, I. Orue, A. V. Svalov, K. Wilson, P. Müllner, J. M. Barandiarán, V. A. Chernenko

Micron School of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

22 Scopus citations

Abstract

Ni-Mn-Ga thin films exhibiting a martensitic transformation (MT) overlapping with the Curie temperature have been sputter-deposited onto heated Si/SiN_x substrates. The films had a partially oriented polycrystalline structure and the tetragonal 10 M-martensitic phase undergoing a reverse MT into cubic austenite between 57 and 156°C. The MT was studied with structural, substrate curvature, magnetic and resistivity methods. The substrate imposed residual stress which changes the sign of the transformation volume strain across MT. The role of the magnetocrystalline anisotropy and its impact on magnetic properties are interpreted in terms of film texture and film stiffness.

Original language	English
Pages (from-to)	449-454
Number of pages	6
Journal	Thin Solid Films
Volume	558
DOIs	https://doi.org/10.1016/j.tsf.2014.02.056
State	Published - 2 May 2014

Keywords

Crystal structure
Internal stress
Magnetic anisotropy
Martensitic transformation
Ni-Mn-Ga thin films

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10.1016/j.tsf.2014.02.056

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title = "Martensitic transformation in Ni-Mn-Ga/Si(100) thin films",

abstract = "Ni-Mn-Ga thin films exhibiting a martensitic transformation (MT) overlapping with the Curie temperature have been sputter-deposited onto heated Si/SiNx substrates. The films had a partially oriented polycrystalline structure and the tetragonal 10 M-martensitic phase undergoing a reverse MT into cubic austenite between 57 and 156°C. The MT was studied with structural, substrate curvature, magnetic and resistivity methods. The substrate imposed residual stress which changes the sign of the transformation volume strain across MT. The role of the magnetocrystalline anisotropy and its impact on magnetic properties are interpreted in terms of film texture and film stiffness.",

keywords = "Crystal structure, Internal stress, Magnetic anisotropy, Martensitic transformation, Ni-Mn-Ga thin films",

author = "Aseguinolaza, {I. R.} and I. Orue and Svalov, {A. V.} and K. Wilson and P. M{\"u}llner and Barandiar{\'a}n, {J. M.} and Chernenko, {V. A.}",

year = "2014",

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doi = "10.1016/j.tsf.2014.02.056",

language = "English",

volume = "558",

pages = "449--454",

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TY - JOUR

T1 - Martensitic transformation in Ni-Mn-Ga/Si(100) thin films

AU - Aseguinolaza, I. R.

AU - Orue, I.

AU - Svalov, A. V.

AU - Wilson, K.

AU - Müllner, P.

AU - Barandiarán, J. M.

AU - Chernenko, V. A.

PY - 2014/5/2

Y1 - 2014/5/2

N2 - Ni-Mn-Ga thin films exhibiting a martensitic transformation (MT) overlapping with the Curie temperature have been sputter-deposited onto heated Si/SiNx substrates. The films had a partially oriented polycrystalline structure and the tetragonal 10 M-martensitic phase undergoing a reverse MT into cubic austenite between 57 and 156°C. The MT was studied with structural, substrate curvature, magnetic and resistivity methods. The substrate imposed residual stress which changes the sign of the transformation volume strain across MT. The role of the magnetocrystalline anisotropy and its impact on magnetic properties are interpreted in terms of film texture and film stiffness.

AB - Ni-Mn-Ga thin films exhibiting a martensitic transformation (MT) overlapping with the Curie temperature have been sputter-deposited onto heated Si/SiNx substrates. The films had a partially oriented polycrystalline structure and the tetragonal 10 M-martensitic phase undergoing a reverse MT into cubic austenite between 57 and 156°C. The MT was studied with structural, substrate curvature, magnetic and resistivity methods. The substrate imposed residual stress which changes the sign of the transformation volume strain across MT. The role of the magnetocrystalline anisotropy and its impact on magnetic properties are interpreted in terms of film texture and film stiffness.

KW - Crystal structure

KW - Internal stress

KW - Magnetic anisotropy

KW - Martensitic transformation

KW - Ni-Mn-Ga thin films

UR - http://www.scopus.com/inward/record.url?scp=84898825236&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2014.02.056

DO - 10.1016/j.tsf.2014.02.056

M3 - Article

AN - SCOPUS:84898825236

SN - 0040-6090

VL - 558

SP - 449

EP - 454

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Martensitic transformation in Ni-Mn-Ga/Si(100) thin films

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Keywords

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