TY - JOUR
T1 - NO2 Gas Sorption Studies of Ge33Se67 Films Using Quartz Crystal Microbalance
AU - Georgieva, Velichka
AU - Mitkova, Maria
AU - Chen, Ping
AU - Tenne, Dmitri
AU - Wolf, Kasandra
AU - Gadjanova, Victoria
PY - 2012/12/14
Y1 - 2012/12/14
N2 - A study on the NO2 gas sorption ability of amorphous Ge33Se67 coated quartz crystal microbalance (QCM) is presented. The thin films have been characterized before and after sorption/desorption processes of NO2 by energy-dispersive X-ray spectroscopy (EDS), grazing angle X-ray diffraction (GAXRD), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and atom force microscopy (AFM) measurements. These studies indicated that physisorption occurs when NO2 gas molecules are introduced into the chalcogenide film and the thin film composition or structure do not change. The mass loading due to NO2 gas sorption was calculated by the resonator’s frequency shift. At the conditions of our experiment, up to 6.8 ng of the gas was sorbed into 200 nm thick Ge33Se67 film at 5000 ppm NO2 concentration. It has been established that the process of gas molecules sorption is reversible.
AB - A study on the NO2 gas sorption ability of amorphous Ge33Se67 coated quartz crystal microbalance (QCM) is presented. The thin films have been characterized before and after sorption/desorption processes of NO2 by energy-dispersive X-ray spectroscopy (EDS), grazing angle X-ray diffraction (GAXRD), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and atom force microscopy (AFM) measurements. These studies indicated that physisorption occurs when NO2 gas molecules are introduced into the chalcogenide film and the thin film composition or structure do not change. The mass loading due to NO2 gas sorption was calculated by the resonator’s frequency shift. At the conditions of our experiment, up to 6.8 ng of the gas was sorbed into 200 nm thick Ge33Se67 film at 5000 ppm NO2 concentration. It has been established that the process of gas molecules sorption is reversible.
KW - Chalcogenides
KW - thin films
KW - X-ray photo-emission spectroscopy (XPS)
KW - atomic force microscopy (AFM)
UR - https://scholarworks.boisestate.edu/electrical_facpubs/216
UR - http://dx.doi.org/10.1016/j.matchemphys.2012.09.057
U2 - 10.1016/j.matchemphys.2012.09.057
DO - 10.1016/j.matchemphys.2012.09.057
M3 - Article
SN - 0254-0584
JO - Materials Chemistry and Physics
JF - Materials Chemistry and Physics
ER -