Optical and crystallographic properties of inverse opal photonic crystals grown by atomic layer deposition

Jeffrey S. King; Curtis W. Neff; Dawn L. Heineman; Elton D. Graugnard; Christopher J. Summers

doi:10.1557/proc-797-w3.9

Optical and crystallographic properties of inverse opal photonic crystals grown by atomic layer deposition

Jeffrey S. King, Curtis W. Neff, Dawn L. Heineman, Elton D. Graugnard, Christopher J. Summers

Micron School of Materials Science and Engineering

Georgia Institute of Technology

Research output: Contribution to journal › Conference article › peer-review

1 Scopus citations

Abstract

We report a technique for the formation of infiltrated and inverse opal structures that produces high quality, low porosity conformal material structures. ZnS:Mn and TiO₂ were deposited within the void space of an opal lattice by atomic layer deposition. The resulting structures were etched with HF to remove the silica opal template. Infiltrated and inverse opals were characterized by SEM, XRD, and transmission/reflection spectroscopy. The reflectance spectra exhibited features corresponding to strong low and high order photonic band gaps in the (111) direction (Γ-L). In addition, deliberate partial infiltrations and multi-layered inverse opals have been formed. The effectiveness of a post-deposition heat treatment for converting TiO₂ films to rutile was also studied.

Original language	English
Pages (from-to)	75-80
Number of pages	6
Journal	Materials Research Society Symposium Proceedings
Volume	797
DOIs	https://doi.org/10.1557/proc-797-w3.9
State	Published - 2003
Event	Engineered Porosity for Microphotonics and Plasmonics - Boston, MA., United States Duration: 2 Dec 2003 → 4 Dec 2003

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title = "Optical and crystallographic properties of inverse opal photonic crystals grown by atomic layer deposition",

abstract = "We report a technique for the formation of infiltrated and inverse opal structures that produces high quality, low porosity conformal material structures. ZnS:Mn and TiO2 were deposited within the void space of an opal lattice by atomic layer deposition. The resulting structures were etched with HF to remove the silica opal template. Infiltrated and inverse opals were characterized by SEM, XRD, and transmission/reflection spectroscopy. The reflectance spectra exhibited features corresponding to strong low and high order photonic band gaps in the (111) direction (Γ-L). In addition, deliberate partial infiltrations and multi-layered inverse opals have been formed. The effectiveness of a post-deposition heat treatment for converting TiO2 films to rutile was also studied.",

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doi = "10.1557/proc-797-w3.9",

language = "English",

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journal = "Materials Research Society Symposium Proceedings",

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note = "Engineered Porosity for Microphotonics and Plasmonics ; Conference date: 02-12-2003 Through 04-12-2003",

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TY - JOUR

T1 - Optical and crystallographic properties of inverse opal photonic crystals grown by atomic layer deposition

AU - King, Jeffrey S.

AU - Neff, Curtis W.

AU - Heineman, Dawn L.

AU - Graugnard, Elton D.

AU - Summers, Christopher J.

PY - 2003

Y1 - 2003

N2 - We report a technique for the formation of infiltrated and inverse opal structures that produces high quality, low porosity conformal material structures. ZnS:Mn and TiO2 were deposited within the void space of an opal lattice by atomic layer deposition. The resulting structures were etched with HF to remove the silica opal template. Infiltrated and inverse opals were characterized by SEM, XRD, and transmission/reflection spectroscopy. The reflectance spectra exhibited features corresponding to strong low and high order photonic band gaps in the (111) direction (Γ-L). In addition, deliberate partial infiltrations and multi-layered inverse opals have been formed. The effectiveness of a post-deposition heat treatment for converting TiO2 films to rutile was also studied.

AB - We report a technique for the formation of infiltrated and inverse opal structures that produces high quality, low porosity conformal material structures. ZnS:Mn and TiO2 were deposited within the void space of an opal lattice by atomic layer deposition. The resulting structures were etched with HF to remove the silica opal template. Infiltrated and inverse opals were characterized by SEM, XRD, and transmission/reflection spectroscopy. The reflectance spectra exhibited features corresponding to strong low and high order photonic band gaps in the (111) direction (Γ-L). In addition, deliberate partial infiltrations and multi-layered inverse opals have been formed. The effectiveness of a post-deposition heat treatment for converting TiO2 films to rutile was also studied.

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DO - 10.1557/proc-797-w3.9

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AN - SCOPUS:2442614876

SN - 0272-9172

VL - 797

SP - 75

EP - 80

JO - Materials Research Society Symposium Proceedings

JF - Materials Research Society Symposium Proceedings

T2 - Engineered Porosity for Microphotonics and Plasmonics

Y2 - 2 December 2003 through 4 December 2003

ER -

Optical and crystallographic properties of inverse opal photonic crystals grown by atomic layer deposition

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