Oxygen incorporation in AlInP, and its effect on P-type doping with magnesium

  • S. A. Stockman
  • , J. W. Huang
  • , T. D. Osentowski
  • , H. C. Chui
  • , M. J. Peanasky
  • , S. A. Maranowski
  • , P. N. Grillot
  • , A. J. Moll
  • , C. H. Chen
  • , C. P. Kuo
  • , B. W. Liang

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

Oxygen incorporation in AlyIn1-yP (y approx. 0.5) grown by metalorganic chemical vapor deposition (MOCVD) has been studied as a function of PH3 flow, growth temperature, and alloy composition. Both O2 and diethylaluminum ethoxide (DEAlO) were employed as sources of oxygen. The incorporation of oxygen was found to be a superlinear function of O2 or DEAlO flow. When multiple sources of oxygen are present, a surface interaction leads to enhanced oxygen incorporation. Oxygen incorporation cannot be adequately described by a simple dependence on growth temperature or V/III ratio due to strong interactions between these variables. In Mg-doped AlInP co-doped with oxygen, the incorporation of both Mg and O is strongly affected by an interaction between the two species, and roughly 10% of the oxygen atoms act as compensating donors.

Original languageEnglish
Pages (from-to)916-925
Number of pages10
JournalJournal of Electronic Materials
Volume28
Issue number7
DOIs
StatePublished - Jul 1999

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