Abstract
<div class="line" id="line-9"> The formation of multilayered inverse opal photonic crystals by atomic layer deposition has been investigated, and shown to provide a flexible and precise technique to control the properties of photonic crystals. Inverse opals were formed by infiltration of SiO2 opal templates with conformal layers of ZnS:Mn and TiO2, followed by etching. The optical properties were further tuned by backfilling the structures with TiO2. The high-order band structure and its influence on the photoluminescent properties were studied and modification of the Cl− and Mn2+ emission peaks at 460 and 585 nm were demonstrated, respectively.</div>
Original language | American English |
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Journal | Applied Physics Letters |
Volume | 88 |
Issue number | 8 |
State | Published - 20 Feb 2006 |
Externally published | Yes |
Keywords
- atomic layer deposition
- band structure
- etching
- manganese
- optical multilayers
- photoluminescence
- photonic band gap
- photonic crystals
- silicon compounds
- titanium compounds
- zinc compounds
EGS Disciplines
- Mechanical Engineering