Abstract
The formation of multilayered inverse opal photonic crystals by atomic layer deposition has been investigated, and shown to provide a flexible and precise technique to control the properties of photonic crystals. Inverse opals were formed by infiltration of SiO2 opal templates with conformal layers of ZnS:Mn and TiO2, followed by etching. The optical properties were further tuned by backfilling the structures with TiO2. The high-order band structure and its influence on the photoluminescent properties were studied and modification of the Cl- and Mn2+ emission peaks at 460 and 585 nm were demonstrated, respectively.
Original language | English |
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Article number | 081109 |
Journal | Applied Physics Letters |
Volume | 88 |
Issue number | 8 |
DOIs | |
State | Published - 2006 |