Photonic Band Tuning in 2D Photonic Crystals by Atomic Layer Deposition

Elton Graugnard; Davy P. Gaillot; Simon N. Dunham; Curtis W. Neff; Tsuyoshi Yamashita; Christopher J. Summers

doi:0.1109/LEOS.2006.278973

Photonic Band Tuning in 2D Photonic Crystals by Atomic Layer Deposition

Elton Graugnard, Davy P. Gaillot, Simon N. Dunham, Curtis W. Neff, Tsuyoshi Yamashita, Christopher J. Summers

Boise State University

Georgia Institute of Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Scopus citations

Abstract

Atomic layer deposition (ALD) has become a powerful tool for the fabrication of high quality 3-dimentional photonic crystals (PCs) from both inorganic (opal) and organic (holographically patterned polymer) templates [1,2]. With ALD, highly conformal films can be grown with a precision of 0.05 nm, which, when combined with the availability of a wide range of low temperature film growth protocols, enables a high degree of control over material and structural properties to precisely tune optical properties [3]. Two-dimensional photonic crystals have been developed extensively for applications in optical interconnects, beam steering, and sensor devices; and are predominantly fabricated by electron-beam lithography. The optical properties of 2D photonic crystal slab waveguides are determined by the precision of the lithography process, with limited post fabrication tunability.

Original language	American English
Title of host publication	LEOS 2006 - 19th Annual Meeting of the IEEE Lasers and Electro-Optics Society
Pages	763-764
Number of pages	2
DOIs	https://doi.org/0.1109/LEOS.2006.278973
State	Published - Oct 2006
Event	IEEE/LEOS - Duration: 1 Oct 2006 → …

Conference

Conference	IEEE/LEOS
Period	1/10/06 → …

Keywords

atomic layer deposition
optical fabrication
optical materials
optical tuning
optical waveguides
photonic crystals

EGS Disciplines

Materials Science and Engineering

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0.1109/LEOS.2006.278973

Cite this

@inproceedings{71df9e50132a424e87a24bd395891bf4,

title = "Photonic Band Tuning in 2D Photonic Crystals by Atomic Layer Deposition",

abstract = " Atomic layer deposition (ALD) has become a powerful tool for the fabrication of high quality 3-dimentional photonic crystals (PCs) from both inorganic (opal) and organic (holographically patterned polymer) templates [1,2]. With ALD, highly conformal films can be grown with a precision of 0.05 nm, which, when combined with the availability of a wide range of low temperature film growth protocols, enables a high degree of control over material and structural properties to precisely tune optical properties [3]. Two-dimensional photonic crystals have been developed extensively for applications in optical interconnects, beam steering, and sensor devices; and are predominantly fabricated by electron-beam lithography. The optical properties of 2D photonic crystal slab waveguides are determined by the precision of the lithography process, with limited post fabrication tunability.",

keywords = "atomic layer deposition, optical fabrication, optical materials, optical tuning, optical waveguides, photonic crystals",

author = "Elton Graugnard and Gaillot, {Davy P.} and Dunham, {Simon N.} and Neff, {Curtis W.} and Tsuyoshi Yamashita and Summers, {Christopher J.}",

note = "{\textcopyright}2006 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. DOI: 10.1109/LEOS.2006.278973; IEEE/LEOS ; Conference date: 01-10-2006",

year = "2006",

month = oct,

doi = "0.1109/LEOS.2006.278973",

language = "American English",

pages = "763--764",

booktitle = "LEOS 2006 - 19th Annual Meeting of the IEEE Lasers and Electro-Optics Society",

}

TY - GEN

T1 - Photonic Band Tuning in 2D Photonic Crystals by Atomic Layer Deposition

AU - Graugnard, Elton

AU - Gaillot, Davy P.

AU - Dunham, Simon N.

AU - Neff, Curtis W.

AU - Yamashita, Tsuyoshi

AU - Summers, Christopher J.

N1 - ©2006 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. DOI: 10.1109/LEOS.2006.278973

PY - 2006/10

Y1 - 2006/10

N2 - Atomic layer deposition (ALD) has become a powerful tool for the fabrication of high quality 3-dimentional photonic crystals (PCs) from both inorganic (opal) and organic (holographically patterned polymer) templates [1,2]. With ALD, highly conformal films can be grown with a precision of 0.05 nm, which, when combined with the availability of a wide range of low temperature film growth protocols, enables a high degree of control over material and structural properties to precisely tune optical properties [3]. Two-dimensional photonic crystals have been developed extensively for applications in optical interconnects, beam steering, and sensor devices; and are predominantly fabricated by electron-beam lithography. The optical properties of 2D photonic crystal slab waveguides are determined by the precision of the lithography process, with limited post fabrication tunability.

AB - Atomic layer deposition (ALD) has become a powerful tool for the fabrication of high quality 3-dimentional photonic crystals (PCs) from both inorganic (opal) and organic (holographically patterned polymer) templates [1,2]. With ALD, highly conformal films can be grown with a precision of 0.05 nm, which, when combined with the availability of a wide range of low temperature film growth protocols, enables a high degree of control over material and structural properties to precisely tune optical properties [3]. Two-dimensional photonic crystals have been developed extensively for applications in optical interconnects, beam steering, and sensor devices; and are predominantly fabricated by electron-beam lithography. The optical properties of 2D photonic crystal slab waveguides are determined by the precision of the lithography process, with limited post fabrication tunability.

KW - atomic layer deposition

KW - optical fabrication

KW - optical materials

KW - optical tuning

KW - optical waveguides

KW - photonic crystals

UR - https://scholarworks.boisestate.edu/mse_facpubs/13

U2 - 0.1109/LEOS.2006.278973

DO - 0.1109/LEOS.2006.278973

M3 - Conference contribution

SP - 763

EP - 764

BT - LEOS 2006 - 19th Annual Meeting of the IEEE Lasers and Electro-Optics Society

T2 - IEEE/LEOS

Y2 - 1 October 2006

ER -

Photonic Band Tuning in 2D Photonic Crystals by Atomic Layer Deposition

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Keywords

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