Properties of Sputter-Deposited Ni–Mn–Ga Thin Films

V. A. Chernenko, S. Besseghini, M. Hagler, P. Müllner, M. Ohtsuka, F. Stortiero

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

Sub-micrometer Ni–Mn–Ga films on MgO(0 0 1) single-crystalline wafers have been prepared by radio-frequency magnetron sputtering. The structural and magnetic states of the as-received (quasi-amorphous phase) and annealed (highly ordered martensitic phase at T = 300 K) films have been examined by X-ray diffraction, and measurements of resistivity and magnetization. The annealed films demonstrate a transformation behavior typical for the bulk and show a thickness dependence of the magnetic properties.

Original languageAmerican English
Pages (from-to)271-274
Number of pages4
JournalMaterials Science and Engineering: A
Volume481-482
Issue number1-2 C
DOIs
StatePublished - 25 May 2008

Keywords

  • Magnetic anisotropy
  • Martensitic transformation
  • MgO(0 0 1) wafer
  • Ni-Mn-Ga thin film

EGS Disciplines

  • Materials Science and Engineering

Fingerprint

Dive into the research topics of 'Properties of Sputter-Deposited Ni–Mn–Ga Thin Films'. Together they form a unique fingerprint.

Cite this