Abstract
Two different displacement damage experiments were performed on CBRAM cells. In one experiment, conductive bridging random access memory (CBRAM) cells were exposed to 14 MeV neutrons to a total fluence of 3.19 × 10 13 n/cm 2 . In the second test, CBRAM cells were bombarded with 200 keV Si 2+ ions. In both the experiments, the high resistance and low resistance states (LRSs) of the cells were observed to converge with increasing particle fluence. After reaching a 14 MeV neutron fluence of 2.93 × 10 13 n/cm 2 , the CBRAM cells became irrecoverably locked into their final resistance state. In situ testing during heavy ion exposure showed a steady decrease in the resistance state of each cell with each successive exposure to the beam. The devices eventually became locked in an LRS.
Original language | American English |
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Journal | IEEE Transactions on Nuclear Science |
DOIs | |
State | Published - 1 Aug 2017 |
Keywords
- Cation
- chalcogenide glass
- conductive bridging
- conductive bridging random access memory (CBRAM)
- displacement damage
- electrochemical metallization
EGS Disciplines
- Electrical and Computer Engineering