TY - JOUR
T1 - Static Impedance Behavior of Programmable Metallization Cells
AU - Mitkova, M.
N1 - Mitkova, Maria. (2015). "Static Impedance Behavior of Programmable Metallization Cells". Solid-State Electronics, 106, 27-33. http://dx.doi.org/10.1016/j.sse.2014.12.019
PY - 2015/4/1
Y1 - 2015/4/1
N2 - Programmable metallization cell (PMC) devices work by growing and dissolving a conducting metallic bridge across a chalcogenide glass (ChG) solid electrolyte, which changes the resistance of the cell. PMC operation relies on the incorporation of metal ions in the ChG films via photo-doping to lower the off-state resistance and stabilize resistive switching, and subsequent transport of these ions by electric fields induced from an externally applied bias. In this paper, the static on- and off-state resistance of a PMC device composed of a layered (Ag-rich/Ag-poor) Ge 30 Se 70 ChG film with active Ag and inert Ni electrodes is characterized and modeled using three dimensional simulation code. Calibrating the model to experimental data enables the extraction of device parameters such as material bandgaps, workfunctions, density of states, carrier mobilities, dielectric constants, and affinities.
AB - Programmable metallization cell (PMC) devices work by growing and dissolving a conducting metallic bridge across a chalcogenide glass (ChG) solid electrolyte, which changes the resistance of the cell. PMC operation relies on the incorporation of metal ions in the ChG films via photo-doping to lower the off-state resistance and stabilize resistive switching, and subsequent transport of these ions by electric fields induced from an externally applied bias. In this paper, the static on- and off-state resistance of a PMC device composed of a layered (Ag-rich/Ag-poor) Ge 30 Se 70 ChG film with active Ag and inert Ni electrodes is characterized and modeled using three dimensional simulation code. Calibrating the model to experimental data enables the extraction of device parameters such as material bandgaps, workfunctions, density of states, carrier mobilities, dielectric constants, and affinities.
KW - Resistive RAM (ReRAM)
KW - chalcogenide
KW - impedance
KW - nano-ionic memory
KW - parametric model
KW - programmable metallization cells
UR - https://scholarworks.boisestate.edu/electrical_facpubs/280
UR - http://dx.doi.org/10.1016/j.sse.2014.12.019
U2 - 10.1016/j.sse.2014.12.019
DO - 10.1016/j.sse.2014.12.019
M3 - Article
JO - Solid-State Electronics
JF - Solid-State Electronics
ER -