Abstract
A collisional model that describes the response of a microwave multipolar bucket plasma to a high voltage pulse has been developed for plasma source ion implantation (PSII). Measurement of the sheath position and target current in a 100 mtorr helium plasma are found to be consistent with the model. Sheath thicknesses predicted by the collisional model are significantly less than those predicted by similar noncollisional models.
Original language | English |
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Pages (from-to) | 1272-1278 |
Number of pages | 7 |
Journal | IEEE Transactions on Plasma Science |
Volume | 19 |
Issue number | 6 |
DOIs | |
State | Published - Dec 1991 |