The Response of a Microwave Multipolar Bucket Plasma to a High Voltage Pulse

Shu Qin; Chung Chan; Nicol E. McGruer; Jim Browning; Keith Warner

doi:10.1109/27.125051

The Response of a Microwave Multipolar Bucket Plasma to a High Voltage Pulse

Shu Qin
, Chung Chan
, Nicol E. McGruer
, Jim Browning
, Keith Warner

Electrical Engineering Department

Northeastern University

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

A collisional model that describes the response of a microwave multipolar bucket plasma to a high voltage pulse has been developed for plasma source ion implantation (PSII). Measurement of the sheath position and target current in a 100 mtorr helium plasma are found to be consistent with the model. Sheath thicknesses predicted by the collisional model are significantly less than those predicted by similar noncollisional models.

Original language	English
Pages (from-to)	1272-1278
Number of pages	7
Journal	IEEE Transactions on Plasma Science
Volume	19
Issue number	6
DOIs	https://doi.org/10.1109/27.125051
State	Published - Dec 1991

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title = "The Response of a Microwave Multipolar Bucket Plasma to a High Voltage Pulse",

abstract = "A collisional model that describes the response of a microwave multipolar bucket plasma to a high voltage pulse has been developed for plasma source ion implantation (PSII). Measurement of the sheath position and target current in a 100 mtorr helium plasma are found to be consistent with the model. Sheath thicknesses predicted by the collisional model are significantly less than those predicted by similar noncollisional models.",

author = "Shu Qin and Chung Chan and McGruer, \{Nicol E.\} and Jim Browning and Keith Warner",

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T1 - The Response of a Microwave Multipolar Bucket Plasma to a High Voltage Pulse

AU - Qin, Shu

AU - Chan, Chung

AU - McGruer, Nicol E.

AU - Browning, Jim

AU - Warner, Keith

PY - 1991/12

Y1 - 1991/12

N2 - A collisional model that describes the response of a microwave multipolar bucket plasma to a high voltage pulse has been developed for plasma source ion implantation (PSII). Measurement of the sheath position and target current in a 100 mtorr helium plasma are found to be consistent with the model. Sheath thicknesses predicted by the collisional model are significantly less than those predicted by similar noncollisional models.

AB - A collisional model that describes the response of a microwave multipolar bucket plasma to a high voltage pulse has been developed for plasma source ion implantation (PSII). Measurement of the sheath position and target current in a 100 mtorr helium plasma are found to be consistent with the model. Sheath thicknesses predicted by the collisional model are significantly less than those predicted by similar noncollisional models.

UR - https://www.scopus.com/pages/publications/0026370907

U2 - 10.1109/27.125051

DO - 10.1109/27.125051

M3 - Article

AN - SCOPUS:0026370907

SN - 0093-3813

VL - 19

SP - 1272

EP - 1278

JO - IEEE Transactions on Plasma Science

JF - IEEE Transactions on Plasma Science

IS - 6

ER -

The Response of a Microwave Multipolar Bucket Plasma to a High Voltage Pulse

Abstract

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