Tunneling Electron Induced Bromine Hopping on Si(100)-(2×1)

Koji S. Nakayama, Elton Graugnard, J. H. Weaver

Research output: Contribution to journalArticlepeer-review

Abstract

Tunneling electrons from the tip of a scanning tunneling microscope can be used to induce adatom hopping on Br-terminated Si(100)-(2×1) at low current and without voltage pulses. Hopping does not occur when electrons tunnel from a sample to a tip. The threshold energy is +0.8  V, and tunneling spectroscopy shows antibonding Si-Br states 0.8 eV above the Fermi level. Electron capture in these states is a necessary condition for hopping, but repulsive adsorbate interactions that lower the activation barrier are also required. Such interactions are strong near saturation for Br but are insufficient when the coverage is low or when Br is replaced by Cl.
Original languageAmerican English
JournalPhysical Review Letters
Volume89
Issue number26
StatePublished - 23 Dec 2002
Externally publishedYes

EGS Disciplines

  • Mechanical Engineering

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